2 papers
physics.plasm-ph2020
Plasma-assisted Discharges and Charging in EUV-induced Plasma
Mark van de Kerkhof, Andrei M. Yakunin, Vladimir Kvon +4
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. Thi…
physics.app-ph2020
Dielectric particle lofting from dielectric substrate exposed to low energy electron beam
P. V. Krainov, V. V. Ivanov, D. I. Astakhov +4
The particle-in-cell simulation is applied to study a nanometer-sized dielectric particle lofting from a dielectric substrate exposed to a low energy electron beam. The article dis…