activity
20202024
most citedInvestigation of microwave loss induced by oxide regrowth in high-Q Nb resonators

105 citations · 368 across the 13 of their papers we have counts for

collaborators
Showing cond-mat.mes-hallShow all

9 papers · 1 filter

cond-mat.mes-hall2024★ 3 cited

Radiofrequency cascade readout of coupled spin qubits

Jacob F. Chittock-Wood, Ross C. C. Leon, Michael A. Fogarty +12

Silicon spin qubits based on metal-oxide-semiconductor (MOS) technology are compatible with semiconductor manufacturing and offer a route to scalable quantum processing. However, s…

cond-mat.mes-hall2023★ 6 cited

An elongated quantum dot as a distributed charge sensor

S. M. Patomäki, J. Williams, F. Berritta +10

Increasing the separation between semiconductor quantum dots offers scaling advantages by fa- cilitating gate routing and the integration of sensors and charge reservoirs. Elongate…

cond-mat.mes-hall2022★ 55 cited

Low charge noise quantum dots with industrial CMOS manufacturing

Asser Elsayed, Mohamed Shehata, Clement Godfrin +12

Silicon spin qubits are among the most promising candidates for large scale quantum computers, due to their excellent coherence and compatibility with CMOS technology for upscaling…

cond-mat.mes-hall2022★ 20 cited

Physics-Based and Closed-Form Model for Cryo-CMOS Subthreshold Swing

Arnout Beckers, Jakob Michl, Alexander Grill +7

Cryogenic semiconductor device models are essential in designing control systems for quantum devices and in benchmarking the benefits of cryogenic cooling for high-performance comp…

cond-mat.mes-hall2022★ 40 cited

Modelling semiconductor spin qubits and their charge noise environment for quantum gate fidelity estimation

M. Mohamed El Kordy Shehata, George Simion, Ruoyu Li +7

The spin of an electron confined in semiconductor quantum dots is currently a promising candidate for quantum bit (qubit) implementations. Taking advantage of existing CMOS integra…

cond-mat.mes-hall2021★ 20 cited

Uniform Spin Qubit Devices in an All-Silicon 300 mm Integrated Process

N. I. Dumoulin Stuyck, R. Li, C. Godfrin +12

Larger arrays of electron spin qubits require radical improvements in fabrication and device uniformity. Here we demonstrate excellent qubit device uniformity and tunability from 3…

cond-mat.mes-hall2021★ 25 cited

Low dephasing and robust micromagnet designs for silicon spin qubits

N. I. Dumoulin Stuyck, F. A. Mohiyaddin, R. Li +3

Using micromagnets to enable electron spin manipulation in silicon qubits has emerged as a very popular method, enabling single-qubit gate fidelities larger than 99:9%. However, th…

cond-mat.mes-hall2021

High mobility SiMOSFETs fabricated in a full 300mm CMOS process

Timothy N. Camenzind, Asser Elsayed, Fahd A. Mohiyaddin +7

The quality of the semiconductor-barrier interface plays a pivotal role in the demonstration of high quality reproducible quantum dots for quantum information processing. In this w…

cond-mat.mes-hall2021★ 1 cited

A flexible 300 mm integrated Si MOS platform for electron- and hole-spin qubits exploration

R. Li, N. I. Dumoulin Stuyck, S. Kubicek +12

We report on a flexible 300 mm process that optimally combines optical and electron beam lithography to fabricate silicon spin qubits. It enables on-the-fly layout design modificat…