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cond-mat.mtrl-sci2022
Suppression of surface roughening during ion bombardment of semiconductors
John A. Scott, James Bishop, Milos Toth
Ion beams are used routinely for processing of semiconductors, particularly sputtering, ion implantation and direct-write fabrication of nanostructures. However, the utility of ion…
cond-mat.mtrl-sci2015
Emergent formation of dynamic topographic patterns in electron beam induced etching
Aiden A. Martin, Alan Bahm, James Bishop +2
Spontaneous formation of geometric patterns is a fascinating, ubiquitous process that provides fundamental insights into the roles of symmetry breaking, anisotropy and nonlinear in…