205 citations · 210 across the 5 of their papers we have counts for
6 papers
Hydrogen plasma inhibits ion beam restructuring of materials
John A. Scott, James Bishop, Garrett Budnik +1
Focused ion beam (FIB) techniques are employed widely for nanofabrication, and processing of materials and devices. However, ion irradiation often gives rise to severe damage due t…
Suppression of surface roughening during ion bombardment of semiconductors
John A. Scott, James Bishop, Milos Toth
Ion beams are used routinely for processing of semiconductors, particularly sputtering, ion implantation and direct-write fabrication of nanostructures. However, the utility of ion…
Recoil Implantation Using Gas-Phase Precursor Molecules
Angus Gale, Johannes E. Fröch, Mehran Kianinia +3
Ion implantation underpins a vast range of devices and technologies that require precise control over the physical, chemical, electronic, magnetic and optical properties of materia…
Bottom up engineering of near-identical quantum emitters in atomically thin materials
Noah Mendelson, Zai-Quan Xu, Toan Trong Tran +9
Quantum technologies require robust and photostable single photon emitters (SPEs) that can be reliably engineered. Hexagonal boron nitride (hBN) has recently emerged as a promising…
Photonic Crystal Cavities from Hexagonal Boron Nitride
Sejeong Kim, Johannes E. Fröch, Joe Christian +7
Development of scalable quantum photonic technologies requires on-chip integration of components such as photonic crystal cavities and waveguides with nonclassical light sources. R…
Emergent formation of dynamic topographic patterns in electron beam induced etching
Aiden A. Martin, Alan Bahm, James Bishop +2
Spontaneous formation of geometric patterns is a fascinating, ubiquitous process that provides fundamental insights into the roles of symmetry breaking, anisotropy and nonlinear in…