22 citations · 23 across the 3 of their papers we have counts for
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physics.plasm-ph2021
EUV-induced Hydrogen Plasma : Pulsed Mode Operation and Confinement in Scanner
Mark van de Kerkhof, Andrei M. Yakunin, Dmitry Astakhov +3
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. Thi…
physics.plasm-ph2020★ 1 cited
Particle lofting from substrate exposed to plasma and electron beam
P. V. Krainov, V. V. Ivanov, D. I. Astakhov +4
A nanometer-sized dielectric particle lying on a dielectric substrate is exposed to the flux of low-energy electrons, ion and electron fluxes from a cold plasma and the fluxes from…