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researcher

Mark van de Kerkhof

3 papers here

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • first author1
  • middle author1
  • last author1

Across the 3 of 3 papers where every author was matched, so the position is known.

fields
  • physics.plasm-ph3
ORCID 0000-0001-6837-6897

identity via Semantic Scholar / OpenAlex

activity
20202024
most citedParticle lofting from substrate exposed to plasma and electron beam

1 citations · 1 across the 3 of their papers we have counts for

collaborators

3 papers

physics.plasm-ph2024

Electromagnetic particle-in-cell modeling of an electron cyclotron resonance plasma discharge in hydrogen

D. Eremin, Yu. Sharova, L. Heijmans +4

A low pressure discharge sustained in molecular hydrogen with help of the electron cyclotron resonance heating at a frequency of 2.45 GHz is simulated using a fully electromagnetic…

physics.plasm-ph2021

EUV-induced Hydrogen Plasma : Pulsed Mode Operation and Confinement in Scanner

Mark van de Kerkhof, Andrei M. Yakunin, Dmitry Astakhov +3

In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. Thi…

physics.plasm-ph2020★ 1 cited

Particle lofting from substrate exposed to plasma and electron beam

P. V. Krainov, V. V. Ivanov, D. I. Astakhov +4

A nanometer-sized dielectric particle lying on a dielectric substrate is exposed to the flux of low-energy electrons, ion and electron fluxes from a cold plasma and the fluxes from…

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Not affiliated with arXiv. Researcher data from Semantic Scholar (ODC-BY) and OpenAlex.