22 citations · 23 across the 3 of their papers we have counts for
3 papers
AFM-based Hamaker Constant Determination with Blind Tip Reconstruction
Benny Ku, Ferdinandus van de Wetering, Jens Bolten +3
Particle contamination of extreme ultraviolet (EUV) photomasks is one of the numerous challenges in nanoscale semiconductor fabrication, since it can lead to systematic device fail…
EUV-induced Hydrogen Plasma : Pulsed Mode Operation and Confinement in Scanner
Mark van de Kerkhof, Andrei M. Yakunin, Dmitry Astakhov +3
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. Thi…
Particle lofting from substrate exposed to plasma and electron beam
P. V. Krainov, V. V. Ivanov, D. I. Astakhov +4
A nanometer-sized dielectric particle lying on a dielectric substrate is exposed to the flux of low-energy electrons, ion and electron fluxes from a cold plasma and the fluxes from…