activity
20042023
most citedNanopatterning of Si surfaces by normal incident ion erosion: influence of metal incorporation on surface morphology evolution

48 citations · 121 across the 5 of their papers we have counts for

collaborators

6 papers

physics.ins-det2023★ 1 cited

Roadmap for focused ion beam technologies

Katja Höflich, Gerhard Hobler, Frances I. Allen +29

The focused ion beam (FIB) is a powerful tool for the fabrication, modification and characterization of materials down to the nanoscale. Starting with the gallium FIB, which was or…

cond-mat.mes-hall2019★ 15 cited

Site-controlled formation of single Si nanocrystals in a buried SiO2 matrix using ion beam mixing

Xiaomo Xu, Thomas Prüfer, Daniel Wolf +8

For future nanoelectronic devices - such as room-temperature single electron transistors - the site-controlled formation of single Si nanocrystals (NCs) is a crucial prerequisite.…

physics.app-ph2019★ 11 cited

Morphology modifcation of Si nanopillars under ion irradiation at elevated temperatures: plastic deformation and controlled thinning to 10 nm

Xiaomo Xu, Karl-Heinz Heinig, Wolfhard Möller +6

Si nanopillars of less than 50 nm diameter have been irradiated in a helium ion microscope with a focused Ne beam. The morphological changes due to ion beam irradiation at room…

cond-mat.mtrl-sci2018

CMOS-compatible controlled hyperdoping of silicon nanowires

Yonder Berencén, Slawomir Prucnal, Wolfhard Möller +13

Hyperdoping consists of the intentional introduction of deep-level dopants into a semiconductor in excess of equilibrium concentrations. This causes a broadening of dopant energy l…

cond-mat.mtrl-sci2010★ 48 cited

Nanopatterning of Si surfaces by normal incident ion erosion: influence of metal incorporation on surface morphology evolution

Jing Zhou, Stefan Facsko, Ming Lu +1

The morphology evolution of Si (100) surfaces under 1200 eV Ar+ ion bombardment at normal incidence with and without metal incorporation is presented. The formation of nanodot patt…

cond-mat.mtrl-sci2004★ 46 cited

Multi-Dot Floating-Gates for Nonvolatile Semiconductor Memories - Their Ion Beam Synthesis and Morphology

T. Müller, C. Bonafos, K. -H. Heinig +9

Scalability and performance of current flash memories can be improved substantially by replacing the floating poly-Si gate by a layer of Si dots. This multi-dot layer can be fabric…