Nanofocusing optics for an X-ray free-electron laser generating an extreme intensity of 100 EW/cm${}^2$ using total reflection mirrors

Hirokatsu Yumoto, Yuichi Inubushi, Taito Osaka +5

A nanofocusing optical system referred to as $\text{100 exa}$ for an X-ray free-electron laser (XFEL) was developed to generate an extremely high intensity of 100 EW/cm${}^2$ (10$^…