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extreme ultraviolet lithography 1gate set tomography 1quantum dot uniformity 1semiconductor manufacturing 1silicon spin qubits 1

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quant-ph2026

Understanding oxide-thickness-dependent variability in dense Si-MOS quantum dot arrays

Arne Loenders, Jacques Van Damme, Clement Godfrin +19

Achieving uniform and scalable control of semiconductor spin qubits remains a key challenge for large scale quantum computing. In this work, we investigate how gate oxide thickness…