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20132026
most citedMinimal domain size necessary to simulate the field enhancement factor numerically with specified precision

40 citations · 255 across the 20 of their papers we have counts for

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cond-mat.stat-mech2025★ 9 cited

Universal scaling relation for growth phenomena

Evandro A. Rodrigues, Edwin E. Mozo Luis, Thiago A. de Assis +1

The Family-Vicsek relation is a seminal universal relation obtained for the global roughness at the interface of two media in the growth process. In this work, we revisit the scali…

cond-mat.stat-mech2024

Bifractality in one-dimensional Wolf-Villain model

Edwin E. Mozo Luis, Silvio C. Ferreira, Thiago A. de Assis

We introduce a multifractal optimal detrended fluctuation analysis to study the scaling properties of the one-dimensional Wolf-Villain (WV) model for surface growth. This model pro…

cond-mat.stat-mech2020★ 22 cited

Statistics of adatom diffusion in a model of thin film growth

Edwin E. Mozo Luis, Ismael S. S. Carrasco, Thiago A. de Assis +1

We study the statistics of the number of executed hops of adatoms at the surface of films grown with the Clarke-Vvedensky (CV) model in simple cubic lattices. The distributions of…

cond-mat.stat-mech2016★ 13 cited

Optimal detrended fluctuation analysis as a tool for the determination of the roughness exponent of the mounded surfaces

Edwin E. Mozo Luis, Thiago A. de Assis, Silvio C. Ferreira

We present an optimal detrended fluctuation analysis (DFA) and applied it to evaluate the local roughness exponent in non-equilibrium surface growth models with mounded morphology.…

cond-mat.stat-mech2014★ 6 cited

Relaxation after a change in the interface growth dynamics

T. A. de Assis, F. D. A. Aarão Reis

The global effects of sudden changes in the interface growth dynamics are studied using models of the Edwards-Wilkinson (EW) and Kardar-Parisi-Zhang (KPZ) classes during their grow…

cond-mat.stat-mech2013★ 8 cited

Thin film deposition with time varying temperature

T. A. de Assis, F. D. A. A. Reis

We study the effects of time-dependent substrate/film temperature in the deposition of a mesoscopically thick film using a statistical model that accounts for diffusion of adatoms…