R. Nigro

most citedAluminum oxide nucleation in the early stages of atomic layer deposition on epitaxial graphene

39 citations · 39 across the 2 of their papers we have counts for

collaborators

2 papers

physics.app-ph2021

Direct atomic layer deposition of ultrathin aluminium oxide on monolayer $M o S_{2}$ exfoliated on gold: the role of the substrate

Emanuela Schilirò, Raffaella Lo Nigro, Salvatore E. Panasci +5

In this paper we demonstrated the thermal Atomic Layer Deposition (ALD) growth at 250 °C of highly homogeneous and ultra-thin ( $\approx$ 3.6 nm) $A l_{2} O_{3}$ films with excellent insu…

cond-mat.mtrl-sci2020★ 39 cited

Aluminum oxide nucleation in the early stages of atomic layer deposition on epitaxial graphene

E. Schilirò, R. Lo Nigro, S. E. Panasci +5

In this work, the nucleation and growth mechanism of aluminum oxide (Al2O3) in the early stages of the direct atomic layer deposition (ALD) on monolayer epitaxial graphene (EG) on…

Direct atomic layer deposition of ultrathin aluminium oxide on monolayer MoS2​ exfoliated on gold: the role of the substrate

Aluminum oxide nucleation in the early stages of atomic layer deposition on epitaxial graphene

Direct atomic layer deposition of ultrathin aluminium oxide on monolayer $M o S_{2}$ exfoliated on gold: the role of the substrate