39 citations · 66 across the 3 of their papers we have counts for
3 papers
cond-mat.mtrl-sci2023★ 27 cited
Direct atomic layer deposition of ultra-thin and films on gold-supported monolayer
E. Schilirò, S. E. Panasci, A. M. Mio +9
In this paper, the atomic layer deposition (ALD) of ultra-thin films (<4 nm) of and on Au-supported monolayer (1L) is investigated, providing an i…
physics.app-ph2021
Direct atomic layer deposition of ultrathin aluminium oxide on monolayer exfoliated on gold: the role of the substrate
Emanuela Schilirò, Raffaella Lo Nigro, Salvatore E. Panasci +5
In this paper we demonstrated the thermal Atomic Layer Deposition (ALD) growth at 250 °C of highly homogeneous and ultra-thin ( 3.6 nm) films with excellent insu…
cond-mat.mtrl-sci2020★ 39 cited
Aluminum oxide nucleation in the early stages of atomic layer deposition on epitaxial graphene
E. Schilirò, R. Lo Nigro, S. E. Panasci +5
In this work, the nucleation and growth mechanism of aluminum oxide (Al2O3) in the early stages of the direct atomic layer deposition (ALD) on monolayer epitaxial graphene (EG) on…