activity
20142020
most citedMethodology for standard cell compliance and detailed placement for triple patterning lithography

43 citations · 70 across the 6 of their papers we have counts for

collaborators

6 papers

cs.LG2020★ 6 cited

Net2: A Graph Attention Network Method Customized for Pre-Placement Net Length Estimation

Zhiyao Xie, Rongjian Liang, Xiaoqing Xu +3

Net length is a key proxy metric for optimizing timing and power across various stages of a standard digital design flow. However, the bulk of net length information is not availab…

cs.LG2020

Fast IR Drop Estimation with Machine Learning

Zhiyao Xie, Hai Li, Xiaoqing Xu +2

IR drop constraint is a fundamental requirement enforced in almost all chip designs. However, its evaluation takes a long time, and mitigation techniques for fixing violations may…

cs.AR2020

Thermal Analysis of a 3D Stacked High-Performance Commercial Microprocessor using Face-to-Face Wafer Bonding Technology

Rahul Mathur, Chien-Ju Chao, Rossana Liu +6

3D integration technologies are seeing widespread adoption in the semiconductor industry to offset the limitations and slowdown of two-dimensional scaling. High-density 3D integrat…

cs.AR2020★ 10 cited

Stack up your chips: Betting on 3D integration to augment Moore's Law scaling

Saurabh Sinha, Xiaoqing Xu, Mudit Bhargava +3

3D integration, i.e., stacking of integrated circuit layers using parallel or sequential processing is gaining rapid industry adoption with the slowdown of Moore's law scaling. 3D…

cs.AR2018★ 11 cited

Standard Cell Library Design and Optimization Methodology for ASAP7 PDK

Xiaoqing Xu, Nishi Shah, Andrew Evans +3

Standard cell libraries are the foundation for the entire backend design and optimization flow in modern application-specific integrated circuit designs. At 7nm technology node and…

cs.AR2014★ 43 cited

Methodology for standard cell compliance and detailed placement for triple patterning lithography

Bei Yu, Xiaoqing Xu, Jhih-Rong Gao +1

As the feature size of semiconductor process further scales to sub-16nm technology node, triple patterning lithography (TPL) has been regarded one of the most promising lithography…