61 citations · 82 across the 8 of their papers we have counts for
9 papers
Extending Fourier Neural Operators for Modeling Parameterized and Coupled PDEs
Cheng Jing, Uvini Balasuriya Mudiyanselage, Abhishek Verma +3
Parameterized and coupled partial differential equations (PDEs) are central to modeling phenomena in science and engineering, yet neural operator methods that address both aspects…
Inductively Coupled Plasma Driven by Asymmetric Triangular Current Waveform
Shahid Rauf, Tianhong Wang, Jason Kenney +2
Two-dimensional particle-in-cell simulations of an inductively coupled plasma (ICP) are used to investigate the influence of radio-frequency (RF) current waveform and frequency on…
Investigating Instabilities in Magnetized Low-pressure Capacitively-Coupled RF Plasma using Particle-in-Cell (PIC) Simulations
Sathya Ganta, Kallol Bera, Shahid Rauf +5
The effect of a uniform magnetic field on particle transport in low-pressure radio frequency (RF) capacitively coupled plasma (CCP) has been studied using a particle-in-cell (PIC)…
Numerical thermalization in 2D PIC simulations: Practical estimates for low temperature plasma simulations
Sierra Jubin, Andrew Tasman Powis, Willca Villafana +5
The process of numerical thermalization in particle-in-cell (PIC) simulations has been studied extensively. It is analogous to Coulomb collisions in real plasmas, causing particle…
Rotating spokes, potential hump and modulated ionization in radio frequency magnetron discharges
Liang Xu, Haoming Sun, Denis Eremin +4
In this work, the rotating spoke mode in the radio frequency (RF) magnetron discharge, which features the potential hump and the RF-modulated ionization, is observed and analyzed b…
Study of Synchronous RF Pulsing in Dual Frequency Capacitively Coupled Plasma
Abhishek Verma, Shahid Rauf, Kallol Bera +3
Low-pressure multi-frequency capacitively coupled plasmas are used for numerous etch and deposition applications in the semiconductor industry. Pulsing of the radio-frequency (RF)…
Particle-in-cell modeling of electron beam generated plasma
Shahid Rauf, D. Sydorenko, S. Jubin +4
Plasmas generated using energetic electron beams are well known for their low electron temperature () and plasma potential, which makes them attractive for atomic-precision…
Atomic Precision Processing of New Materials for Frontier Microelectronic Applications in High Performance Computing and Artificial Intelligence
Yevgeny Raitses, Sebastian Engelmann, Shahid Rauf +3
This document is a joint response by scientists from the Princeton Plasma Physics Laboratory, IBM T. J. Watson Research Center and Applied Materials, Inc. to the DOE Office of Scie…
QDB: a new database of plasma chemistries and reactions
Jonathan Tennyson, Sara Rahimi, Christian Hill +31
One of the most challenging and recurring problems when modelling plasmas is the lack of data on key atomic and molecular reactions that drive plasma processes. Even when there are…