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20142019
most citedAnalog Circuit Applications based on Ambipolar Graphene/MoTe2 Vertical Transistors

32 citations · 50 across the 5 of their papers we have counts for

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cs.AR2014★ 17 cited

Self-Aligned Double Patterning Friendly Configuration for Standard Cell Library Considering Placement

Jhih-Rong Gao, Bei Yu, Ru Huang +1

Self-aligned double patterning (SADP) has become a promising technique to push pattern resolution limit to sub-22nm technology node. Although SADP provides good overlay controllabi…