collaborators

7 papers

cs.AI2026

Can AI Agents Really Complete RTL-to-GDS? Lessons from Benchmarking Tool-Interactive EDA Workflows

Jinyuan Deng, Zhengrui Chen, Xufeng Wei +4

Large language model (LLM) agents are extending electronic design automation (EDA) beyond static RTL generation toward long-horizon, tool-interactive workflows. Yet it remains uncl…

cs.AI2026

LithoDreamer: A Physics-Informed World Model for Multi-Stage Computational Lithography

Yuqi Jiang, Yumeng Liu, Zimu Li +7

As semiconductor technology nodes scale, computational lithography is essential for ensuring yield and performance. However, lithography is a continuous physical process involving…

cs.RO2026

ScoRe-Flow: Complete Distributional Control via Score-Based Reinforcement Learning for Flow Matching

Xiaotian Qiu, Lukai Chen, Jinhao Li +3

Flow Matching (FM) policies have emerged as an efficient backbone for robotic control, offering fast and expressive action generation that underpins recent large-scale embodied AI…

cs.AR2026

FluxEDA: A Unified Execution Infrastructure for Stateful Agentic EDA

Zhengrui Chen, Zixuan Song, Yu Li +2

Large language models and autonomous agents are increasingly explored for EDA automation, but many existing integrations still rely on script-level or request-level interactions, w…

cs.LG2025

Unitho: A Unified Multi-Task Framework for Computational Lithography

Qian Jin, Yumeng Liu, Yuqi Jiang +2

Reliable, generalizable data foundations are critical for enabling large-scale models in computational lithography. However, essential tasks-mask generation, rule violation detecti…

cs.CV2025

SEM-CLIP: Precise Few-Shot Learning for Nanoscale Defect Detection in Scanning Electron Microscope Image

Qian Jin, Yuqi Jiang, Xudong Lu +5

In the field of integrated circuit manufacturing, the detection and classification of nanoscale wafer defects are critical for subsequent root cause analysis and yield enhancement.…