Quantum lithography, entanglement and Heisenberg-limited parameter estimation

Abstract

We explore the intimate relationship between quantum lithography, Heisenberg-limited parameter estimation and the rate of dynamical evolution of quantum states. We show how both the enhanced accuracy in measurements and the increased resolution in quantum lithography follow from the use of entanglement. Mathematically, the hyperresolution of quantum lithography appears naturally in the derivation of Heisenberg-limited parameter estimation. We also review recent experiments offering a proof of principle of quantum lithography, and we address the question of state preparation and the fabrication of suitable photoresists.

8 pages, to appear in Journal of Optics B

References in corpus (8)

• Two-photon diffraction and quantum lithography
• Quantum enhanced positioning and clock synchronization
• The creation of large photon-number path entanglement conditioned on photodetection
• Measurement of the photonic de Broglie wavelength of biphotons generated by spontaneous parametric down-conversion
• Weak force detection with superposed coherent states
• Conditional generation of N-photon entangled states of light
• Linear optics and projective measurements alone suffice to create large-photon-number path entanglement
• Coherent Superposition States as Quantum Rulers

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