Entangled-State Lithography: Tailoring any Pattern with a Single State

Abstract

We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binominal states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a $(N+1)\times (N+1)$ grid, occupying a square with the side half a wavelength long, can be generated from a $2N$-photon state.

4 pages, 4 figures