Entangled-State Lithography: Tailoring any Pattern with a Single State
arXiv:quant-ph/0011075 · doi:10.1103/PhysRevLett.86.4516
Abstract
We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binominal states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a grid, occupying a square with the side half a wavelength long, can be generated from a -photon state.
4 pages, 4 figures
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Cited by in corpus (33)
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