Comparison of Power Dependence of Microwave Surface Resistance of Unpatterned and Patterned YBCO Thin Film

H. Xin; D. E. Oates; A. C. Anderson; R. L. Slattery; G. Dresselhaus; M. S. Dresselhaus

doi:10.1109/22.853465

paper

Comparison of Power Dependence of Microwave Surface Resistance of Unpatterned and Patterned YBCO Thin Film

arXiv:cond-mat/9906044 · doi:10.1109/22.853465

Abstract

The effect of the patterning process on the nonlinearity of the microwave surface resistance $R_{S}$ of YBCO thin films is investigated. With the use of a sapphire dielectric resonator and a stripline resonator, the microwave $R_{S}$ of YBCO thin films was measured before and after the patterning process, as a function of temperature and the rf peak magnetic field in the film. The microwave loss was also modeled, assuming a $J_{r f}^{2}$ dependence of $Z_{S} (J_{r f})$ on current density $J_{r f}$ . Experimental and modeled results show that the patterning has no observable effect on the microwave residual $R_{S}$ or on the power dependence of $R_{S}$ .

Submitted to IEEE Trans. MTT

Cited by in corpus (1)

Advanced Fabrication Processes for Superconducting Very Large Scale Integrated Circuits