Unconventional MBE Strategies from Computer Simulations for Optimized Growth Conditions

Abstract

We investigate the influence of step edge diffusion (SED) and desorption on Molecular Beam Epitaxy (MBE) using kinetic Monte-Carlo simulations of the solid-on-solid (SOS) model. Based on these investigations we propose two strategies to optimize MBE growth. The strategies are applicable in different growth regimes: During layer-by-layer growth one can exploit the presence of desorption in order to achieve smooth surfaces. By additional short high flux pulses of particles one can increase the growth rate and assist layer-by-layer growth. If, however, mounds are formed (non-layer-by-layer growth) the SED can be used to control size and shape of the three-dimensional structures. By controlled reduction of the flux with time we achieve a fast coarsening together with smooth step edges.

19 pages, 7 figures, submitted to Phys. Rev. B

References in corpus (5)

• The effect of a modulated flux on the growth of thin films
• Island Distance in One-Dimensional Epitaxial Growth
• A simple model of epitaxial growth
• Modeling sublimation by computer simulation: morphology dependent effective energies
• Pulsed sputtering during homoepitaxial surface growth: layer-by-layer forever

Cited by in corpus (5)

• Epitaxial growth with pulsed deposition: Submonolayer scaling and Villain instability
• Quantum Dimensional Zeeman Effect in the Magneto-optical Absorption Spectrum for Quantum Dot - Impurity Center Systems
• Lattice gas study of thin film growth scenarios and transitions between them: Role of substrate
• The influence of the crystal lattice on coarsening in unstable epitaxial growth
• Surface properties of epitaxially grown crystals