Ion-Induced Surface Diffusion in Ion Sputtering
arXiv:cond-mat/9701116 · doi:10.1063/1.120140
Abstract
Ion bombardment is known to enhance surface diffusion and affect the surface morphology. To quantify this phenomenon we calculate the ion-induced diffusion constant and its dependence on the ion energy, flux and angle of incidence. We find that ion bombardment can both enhance and suppress diffusion and that the sign of the diffusion constant depends on the experimental parameters. The effect of ion-induced diffusion on ripple formation and roughening of ion-sputtered surfaces is discussed and summarized in a morphological phase diagram.
4 pages, LaTeX, 3 ps figures
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