High performance hard magnetic NdFeB thick films for integration into Micro-Electro-Mechanical-Systems
arXiv:cond-mat/0703785 · doi:10.1063/1.2710771
Abstract
5m thick NdFeB films have been sputtered onto 100 mm Si substrates using high rate sputtering (18 m/h). Films were deposited at ≤ 500 C and then annealed at 750 C for 10 minutes. While films deposited at temperatures up to 450 C have equiaxed grains, the size of which decreases with increasing deposition temperature, the films deposited at 500 C have columnar grains. The out-of-plane remanent magnetization increases with deposition temperature, reaching a maximum value of 1.4 T, while the coercivity remains constant at about 1.6 T. The maximum energy product achieved (400 kJ/m3) is comparable to that of high-quality NdFeB sintered magnets.