Feedback controlled electromigration in four-terminal nano-junctions
arXiv:cond-mat/0703649 · doi:10.1063/1.2760150
Abstract
We have developed a fast, yet highly reproducible method to fabricate metallic electrodes with nanometer separation using electromigration (EM). We employ four-terminal instead of two-terminal devices in combination with an analog feedback to maintain the voltage over the junction constant. After the initialization phase (T0.2V < U < 0.6V). At the end of this second regime, a gap forms (U > 0.6V). Remarkably, controlled electromigration is still possible in the quasi-ballistic regime.
References in corpus (5)
- Controlled Fabrication of Nanogaps in Ambient Environment for Molecular Electronics
- Kondo Effect in Electromigrated Gold Break Junctions
- The role of Joule heating in the formation of nanogaps by electromigration
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Cited by in corpus (12)
- Quantum phase transition in a single-molecule quantum dot
- Direct measurement of the Seebeck coefficient in a Kondo-correlated single-quantum-dot transistor
- Feedback-controlled electromigration for the fabrication of point contacts
- Multilevel Resistance Switching and Enhanced Spin Transition Temperature in Single Molecule Spin Crossover Nanogap Devices
- Scaling of 1/f noise in tunable break-junctions
- Scanning probe microscopy imaging of metallic nanocontacts
- Current-induced energy barrier suppression for electromigration from first principles
- Out-of-equilibrium singlet-triplet Kondo effect in a single C_60 quantum dot
- Two-dimensional simulations of temperature and current-density distribution in electromigrated structures
- Structure and local charging of electromigrated Au nanocontacts
- Pre-determining the location of electromigrated gaps by nonlinear optical imaging
- Kondo effects in a C_60 single-molecule transistor