Low-T_c Josephson junctions with tailored barrier
arXiv:cond-mat/0612164 · doi:10.1063/1.2655487
Abstract
Nb/Al_2O_3/Ni_{0.6}Cu_{0.4}/Nb based superconductor-insulator-ferromagnet-superconductor (SIFS) Josephson tunnel junctions with a thickness step in the metallic ferromagnetic \Ni_{0.6}\Cu_{0.4} interlayer were fabricated. The step was defined by optical lithography and controlled etching. The step height is on the scale of a few angstroms. Experimentally determined junction parameters by current-voltage characteristics and Fraunhofer pattern indicate an uniform F-layer thickness and the same interface transparencies for etched and non-etched F-layers. This technique could be used to tailor low-T_c Josephson junctions having controlled critical current densities at defined parts of the junction area, as needed for tunable resonators, magnetic-field driven electronics or phase modulated devices.
6 pages, 6 figures, small changes, to be published by JAP
References in corpus (5)
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- Semi-fluxons in long Josephson 0-pi-junctions
- Ground state and bias current induced rearrangement of semifluxons in 0-pi long Josephson junctions
- Quantum tunneling of semifluxons
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Cited by in corpus (5)
- Josephson tunnel junctions with strong ferromagnetic interlayer
- Static and dynamic properties of 0, pi, and 0-pi ferromagnetic tunnel Josephson Junctions
- Magnetic anisotropy in ferromagnetic Josephson junctions
- Ferromagnetic 0-pi Josephson junctions
- Josephson junctions with centered step and local variation of critical current density