Hall resistivity of granular metals
arXiv:cond-mat/0609736 · doi:10.1103/PhysRevLett.99.056803
Abstract
We calculate the Hall conductivity $\sig_{xy}$ and resistivity of a granular system at large tunneling conductance . We show that in the absence of Coulomb interaction the Hall resistivity depends neither on the tunneling conductance nor on the intragrain disorder and is given by the classical formula , where differs from the carrier density inside the grains by a numerical coefficient determined by the shape of the grains. The Coulomb interaction gives rise to logarithmic in temperature correction to in the range $\Ga \lesssim T \lesssim \min(g_T E_c,\ETh)$, where $\Ga$ is the tunneling escape rate, is the charging energy and $\ETh$ is the Thouless energy of the grain.
arXiv comment4 pages, 1 figure
References in corpus (6)
- Granular Electronic Systems
- Quantum Effects in Coulomb Blockade
- Coulomb effects in granular materials at not very low temperatures
- Transport properties of granular metals at low temperatures
- Coulomb Zero-Bias Anomaly: A Semiclassical Calculation
- Transition from insulating to a non-insulating temperature dependence of the conductivity in granular metals
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