Flux-flow resistivity anisotropy in the instability regime in the a-b plane of epitaxial YBCO thin films

Abstract

Measurements of the nonlinear flux-flow resistivity $\rho$ and the critical vortex velocity ${\mathrm{v}}_{\varphi }^{\ast }$ at high voltage bias close to the instability regime predicted by Larkin and Ovchinnikov \cite{LO} are reported along the node and antinode directions of the d-wave order parameter in the \textit{a-b} plane of epitaxial $YB{a}_{2}C{u}_3{O}_{7-\delta }$ films. In this pinning-free regime, $\rho$ and ${\mathrm{v}}_{\varphi }^{\ast }$ are found to be anisotropic with values in the node direction larger on average by 10% than in the antinode direction. The anisotropy of $\rho$ is almost independent of temperature and field. We attribute the observed results to the anisotropic quasiparticle distribution on the Fermi surface of $YB{a}_{2}C{u}_3{O}_{7-\delta }$.

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