Flux-flow resistivity anisotropy in the instability regime in the a-b plane of epitaxial YBCO thin films
arXiv:cond-mat/0606667 · doi:10.1103/PhysRevLett.97.067003
Abstract
Measurements of the nonlinear flux-flow resistivity and the critical vortex velocity at high voltage bias close to the instability regime predicted by Larkin and Ovchinnikov \cite{LO} are reported along the node and antinode directions of the d-wave order parameter in the \textit{a-b} plane of epitaxial films. In this pinning-free regime, and are found to be anisotropic with values in the node direction larger on average by 10% than in the antinode direction. The anisotropy of is almost independent of temperature and field. We attribute the observed results to the anisotropic quasiparticle distribution on the Fermi surface of .
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