Magnetoresistance of atomic-scale electromigrated nickel nanocontacts
arXiv:cond-mat/0510094 · doi:10.1063/1.2172232
Abstract
We report measurements of the electron transport through atomic-scale constrictions and tunnel junctions between ferromagnetic electrodes. Structures are fabricated using a combination of e-beam lithography and controlled electromigration. Sample geometries are chosen to allow independent control of electrode bulk magnetizations. As junction size is decreased to the single channel limit, conventional anisotropic magnetoresistance (AMR) increases in magnitude, approaching the size expected for tunneling magnetoresistance (TMR) upon tunnel junction formation. Significant mesoscopic variations are seen in the magnitude and sign of the magnetoresistance, and no evidence is found of large ballistic magnetoresistance effects.
arXiv comment3 pages, 3 figures
References in corpus (3)
Cited by in corpus (11)
- The Kondo effect in ferromagnetic atomic contacts
- Dynamical Mean-Field Theory for Molecular Electronics: Electronic Structure and Transport Properties
- Anisotropic magnetoresistance and anisotropic tunneling magnetoresistance due to quantum interference in ferromagnetic metal break junctions
- Kondo effect and conductance of nanocontacts with magnetic impurities
- Theoretical study of the conductance of ferromagnetic atomic-sized contacts
- Anisotropic magnetoresistance in nanocontacts
- The nature of the electrical conduction in ferromagnetic atomic-size contacts: insights from shot noise measurements and theoretical simulations
- Emergence of half-metallicity in suspended NiO chains
- Domain-wall induced large magnetoresistance effects at zero applied field in ballistic nanocontacts
- Mesoscopic anisotropic magnetoconductance fluctuations in ferromagnets
- Controlled Electrode Magnetization Alignment in Planar Elliptical Ferromagnetic Break Junction Devices