Epitaxy of strained, nuclear-spin free Ge quantum wells from solid source materials
arXiv:2603.06372
Abstract
Germanium quantum well heterostructures have rapidly emerged as a leading platform for solid-state quantum information processing; however, material quality limits scalability, and higher structural quality, higher purity, as well as zero nuclear spin, are required. Here, we address these problems by employing the heaviest of Ge isotopes, by evaporating high-purity Ge radiation detector material, as utilized in fundamental neutrino particle physics experiments, to fabricate Ge/SiGe quantum wells for quantum applications and explore the respective challenges. Specifically, we demonstrate improved results on strain-relaxed virtual SiGe substrates, forward graded from Si, with a dislocation density below 3.710 cm, explore nuclear spin-free solid-source molecular beam epitaxy, and demonstrate first quantum transport in Ge quantum wells. We demonstrate a record-level quantum well interface width of 0.3 nm by X-ray reflectivity, and quantitatively compare it to atom probe tomography and scanning transmission electron microscopy. The grown layer reveals nuclear-spin-bearing impurity concentrations below 10 cm and chemical impurity levels below 10 cm, except for residual carbon attributed to the graphite crucible of the Ge source, which may reach up to 10 cm. Low-temperature magneto-transport measurements yield electron mobilities of 6.110 cmVs at 15 mK with a carrier density of 2.210 cm, indicating that residual carbon is the dominant scattering mechanism.