Near-field refractometry of van der Waals crystals
arXiv:2411.07926 · doi:10.1515/nanoph-2025-0117
Abstract
Common techniques for measuring refractive indices, such as ellipsometry and goniometry, are ineffective for van der Waals crystal flakes because of their high anisotropy and small, micron-scale, lateral size. To address this, we employ near-field optical microscopy to analyze the guided optical modes within these crystals. By probing these modes in MoS flakes with subwavelength spatial resolution at a wavelength of , we determine both the in-plane and out-of-plane permittivity components of MoS as and , respectively, with a relative uncertainty below , while overcoming the limitations of traditional methods.
References in corpus (16)
- Electric Field Effect in Atomically Thin Carbon Films
- Two Dimensional Atomic Crystals
- Computational 2D Materials Database: Electronic Structure of Transition-Metal Dichalcogenides and Oxides
- k.p theory for two-dimensional transition metal dichalcogenide semiconductors
- Quantum Nanophotonics in Two-Dimensional Materials
- Van der Waals thin films of WTe2 for natural hyperbolic plasmonic surfaces
- Broad Band Optical Properties of Large Area Monolayer CVD Molybdenum Disulfide
- Phase segregation facilitates exfoliation of franckeite crystals to a single unit cell thickness
- Van der Waals Materials for Applications in Nanophotonics
- Extremely confined gap plasmon modes: when nonlocality matters
- Near-field probing of image phonon-polaritons in hexagonal boron nitride on gold crystals
- Nonlinear chiral metasurfaces based on structured van der Waals materials
- Plasmons in the van der Waals charge-density-wave material 2H-TaSe2
- Quantitative near-field characterization of surface plasmon polaritons on monocrystalline gold platelets
- High-index and low-loss topological insulators for mid-infrared nanophotonics
- Fourier analysis of near-field patterns generated by propagating polaritons