Local insulator-to-superconductor transition in amorphous InO films modulated by e-beam irradiation
arXiv:2405.02276 · doi:10.1088/1361-6668/ae0dbf
Abstract
We present a novel method enabling precise post-fabrication modulation of the electrical resistance in micrometer-scale regions of amorphous indium oxide (a-InO) films. By subjecting initially insulating films to an electron beam at room temperature, we demonstrate that the exposed region of the films becomes superconducting. The resultant superconducting transition temperature () is adjustable up to 2.8 K by changing the electron dose and accelerating voltage. This technique offers a compelling alternative to traditional a-InO annealing methods for both fundamental investigations and practical applications. Moreover, it empowers independent adjustment of electrical properties across initially identical a-InO samples on the same substrate, facilitating the creation of superconducting microstructures with precise control at the micrometer scale. Some possible mechanisms for the observed resistance modifications are discussed.
arXiv comment11 pages, 6 figures
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