Local insulator-to-superconductor transition in amorphous InO films modulated by e-beam irradiation
arXiv:2405.02276 · doi:10.1088/1361-6668/ae0dbf
Abstract
We present a novel method enabling precise post-fabrication modulation of the electrical resistance in micrometer-scale regions of amorphous indium oxide (a-InO) films. By subjecting initially insulating films to an electron beam at room temperature, we demonstrate that the exposed region of the films becomes superconducting. The resultant superconducting transition temperature () is adjustable up to 2.8 K by changing the electron dose and accelerating voltage. This technique offers a compelling alternative to traditional a-InO annealing methods for both fundamental investigations and practical applications. Moreover, it empowers independent adjustment of electrical properties across initially identical a-InO samples on the same substrate, facilitating the creation of superconducting microstructures with precise control at the micrometer scale. Some possible mechanisms for the observed resistance modifications are discussed.
11 pages, 6 figures
References in corpus (8)
- Many body localization and thermalization in quantum statistical mechanics
- Localization of interacting fermions at high temperature
- Quantum breakdown of superconductivity in low-dimensional materials
- Compositional disorder and tranport peculiarities in the amorphous indium-oxides
- High field termination of a Cooper-pair insulator
- Slow Dynamics of the Electron-Glasses; the Role of Disorder
- Memory vs. irreversibility in thermal densification of amorphous glasses
- Structural dynamics in thermal-treatment of amorphous indium-oxide films