Alternating Bias Assisted Annealing of Amorphous Oxide Tunnel Junctions
arXiv:2401.07415 · doi:10.1038/s43246-024-00596-z
Abstract
We demonstrate a transformational technique for controllably tuning the electrical properties of fabricated thermally oxidized amorphous aluminum-oxide tunnel junctions. Using conventional test equipment to apply an alternating bias to a heated tunnel barrier, giant increases in the room temperature resistance, greater than 70%, can be achieved. The rate of resistance change is shown to be strongly temperature-dependent, and is independent of junction size in the sub-micron regime. In order to measure their tunneling properties at mK temperatures, we characterized transmon qubit junctions treated with this alternating-bias assisted annealing (ABAA) technique. The measured frequencies follow the Ambegaokar-Baratoff relation between the shifted resistance and critical current. Further, these studies show a reduction of junction-contributed loss on the order of , along with a significant reduction in resonant- and off-resonant-two level system defects when compared to untreated samples. Imaging with high-resolution TEM shows that the barrier is still predominantly amorphous with a more uniform distribution of aluminum coordination across the barrier relative to untreated junctions. This new approach is expected to be widely applicable to a broad range of devices that rely on amorphous aluminum oxide, as well as the many other metal-insulator-metal structures used in modern electronics.
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- Suppressed paramagnetism in amorphous TaO oxides and its link to superconducting qubit performance
- Superconducting qubits in the millions: the potential and limitations of modularity
- Optimizing the frequency positioning of tunable couplers in a circuit QED processor to mitigate spectator effects on quantum operations
- Non-equilibrium Dynamics of Two-level Systems directly after Cryogenic Alternating Bias