High-Sensitivity Characterization of Ultra-Thin Atomic Layers using Spin-Hall Effect of Light
arXiv:2205.00660 · doi:10.1063/5.0102355
Abstract
Magnetic/non-magnetic/heterostructured ultra-thin films' characterisation is highly demanding due to the emerging diverse applications of such films. Diverse measurements are usually performed on such systems to infer their electrical, optical and magnetic properties. We demonstrate that MOKE-based spin-Hall effect of light (SHEL) is a versatile surface characterization tool for studying materials' magnetic and dielectric ordering. Using this technique, we measure magnetic field dependent complex Kerr angle and the coercivity in ultra-thin films of permalloy (Py) and at molybdenum disulphide (MoS) - permalloy (MSPy) hetero-structure interfaces. The measurements are compared with standard magneto-optic Kerr effect (MOKE) studies to demonstrate that SHEL-MOKE is a practical alternative to the conventional MOKE method, with competitive sensitivity. A comprehensive theoretical model and simulation data are provided to further strengthen the potential of this simple non-invasive optical method. The theoretical model is applied to extract the optical conductivity and susceptibility of non-magnetic ultra-thin layers such as MoS .
15 pages, 7 figure, one supplementary document
References in corpus (6)
- Measurement of the optical dielectric function of transition metal dichalcogenide monolayers: MoS2, MoSe2, WS2 and WSe2
- Goos-Hänchen and Imbert-Fedorov beam shifts: An overview
- Role of beam propagation in Goos-Hänchen and Imbert-Fedorov shifts
- Polarization, transverse shifts, and angular momentum conservation laws in partial reflection and refraction of an electromagnetic wave packet
- Optimal preselection and postselection in weak measurements for observing photonic spin Hall effect
- The reflection of a Maxwell-Gaussian beam by a planar surface