Physical limits of ultra-high-finesse optical cavities: Taming two-level systems of glassy metal oxides

Abstract

The framework of tunnelling states in amorphous media provides the dissipative mechanism that imposes fundamental limits on the performances of ultra-high-Q optical and microwave resonators. In the optical domain, however, the microscopic nature of the tunnelling states and their direct consequences to the optical losses have not been characterized. In this work, we examine the interplay between glassy physics and stoichiometric point defects of ultra-low-loss dielectric mirrors, with a focus on two-level systems of oxygen defects in metal oxide, Ta${}_2$O${}_5$. In the context of ultra-high-finesse optical cavities, we characterize the Urbach tail of Ta${}_2$O${}_5$ under thermal annealing and reactive oxygen plasma. For the first time, we microscopically resolve the individual oxygen point defects on the mirror surfaces and introduce laser-assisted annealing to selectively "cure" surface defects. By exploiting these techniques, we report the realization of ultra-high-finesse optical cavity with finesse $\mathcal{F}=450,000$ and the absorption-scatter loss $0.1\pm 0.2$ ppm at $852$ nm.

9 pages, 5 figures

References in corpus (1)

• Topological and topological-electronic correlations in amorphous silicon