paper

Molecular beam epitaxy growth of the highly conductive oxide SrMoO

arXiv:2012.02425 · doi:10.1016/j.jcrysgro.2020.125685

Abstract

SrMoO is a promising material for its excellent electrical conductivity, but growing high-quality thin films remains a challenge. Here we synthesized epitaxial films of SrMoO using the molecular beam epitaxy (MBE) technique under a low oxygen-flow rate. Introduction of SrTiO buffer layers of 4--8 unit cells between the film and the (001)-oriented SrTiO or KTaO substrate was crucial to remove impurities and/or roughness of the film surface. The obtained film shows improved electrical conductivities as compared with films obtained by other techniques. The high quality of the SrMoO film is also verified by angle-resolved photoemission spectroscopy (ARPES) measurements showing clear Fermi surfaces.

6 pages, 5 figures

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