Reentrant Kondo effect in a quantum impurity coupled to a metal-semiconductor hybrid contact

Abstract

Using NRG, we show that a system containing a quantum impurity (QI), strongly coupled to a semiconductor (gap $2\Delta$) and weakly coupled to a metal, displays a 'reentrant' Kondo stage at low temperatures. The NRG analysis of the corresponding Single Impurity Anderson Model (SIAM) shows that the reentrant stage is characterized by a second sequence of SIAM fixed points: free orbital (FO) > local moment (LM) > strong coupling (SC). In the first stage, the SC fixed point (Kondo temperature $T_{K1}$) is unstable, while the second stage exhibits a much lower Kondo temperature $T_{K2}$, associated to a stable SC fixed point. The results indicate that the reentrant Kondo screening is associated to an effective SIAM, with an effective repulsion $U_{eff}$. This low temperature effective SIAM, which we dub as 'reentrant' SIAM, behaves as a 'replica' of the high temperature (bare) SIAM. The intuitive picture that emerges is that the first Kondo state develops through impurity screening by semiconducting electrons, while the second Kondo state involves screening by metallic electrons, once the semiconducting electrons are out of reach to thermal excitations ($T<\Delta$) and only the metallic spectral weight inside the gap is available for impurity screening. In addition, we analyze a hybrid system formed by a QI `sandwiched' between an armchair graphene nanoribbon (AGNR) and a scanning tunneling microscope (STM) tip, with respective couplings set to reproduce the generic model described above. The energy gap in the AGNR can be externally tuned by an electric-field-induced Rashba spin-orbit interaction. We analyzed this system for realistic parameter values, using NRG, and concluded that the reentrant SIAM, with its associated second stage Kondo, is worthy of experimental investigation.

13 pages, 12 figures

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• Flat-Band Driven Kondo Breakdown and Reentrant Effects in Heavy-Fermion Moiré Superlattices
• Sticking coefficient for atoms impinging on a metallic surfaces, and the x-ray photoemission by metals