paper

Long-range order and thermal stability of thin CoFeSi films on GaAs(111)B

arXiv:1907.05306 · doi:10.1088/0022-2327/43/28/285404

Abstract

CoFeSi/GaAs(111)B hybrid structures are grown by molecular-beam epitaxy and characterized by transmission electron microscopy (TEM) and x-ray diffraction. The CoFeSi films grow in an island growth mode at substrate temperatures between ~=~100C and 425C. The structures have a stable interface up to C. The films contain fully ordered and partially ordered phases. The spatial distribution of long-range order in CoFeSi is characterized using a comparison of TEM images taken with superlattice reflections and the corresponding fundamental reflections. The spatial inhomogeneities of long-range order can be explained by local non-stoichiometry due to lateral segregation or stress relaxation without formation of extended defects.