On the role of secondary electron emission in capacitively coupled radio frequency plasma sheath: a theoretical ground
arXiv:1905.11688 · doi:10.1002/ppap.201900093
Abstract
We propose a theoretical ground for emissive capacitively coupled radio-frequency plasma sheath under low pressure. The rf sheath is assumed to be collisionless, and oscillates with external source. A known sinusoidal voltage instead of current is taken as prerequisite to derive sheath dynamics. Kinetic studies are performed to determine mean wall potential as a function of secondary emission coefficient and applied voltage amplitude, with which the complete mean DC sheath is resolved. Analytical analyses under homogeneous model and numerical analyses under inhomogeneous model are conducted to deduce real time sheath properties including space potential, capacitance and stochastic heating. Obtained results are validated by a continuum kinetic simulation without ionization. The influences of collisionality and ionization induced by secondary electrons are elucidated with a particle-in-cell simulation, which further formalizes proposed theories and inspires future works.
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Cited by in corpus (6)
- Intense boundary emission destroys normal radio-frequency plasma sheath
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- An alternative simulation approach for surface flashover in vacuum using a 1D2V continuum and kinetic model
- Unveiling the role of dielectric trap states on capacitively coupled radio-frequency plasma discharge: dynamic charging behaviors
- On the Ohmic-dominant heating mode of capacitively-coupled plasma inverted by boundary electron emission
- On the electron sheath theory and its applications in plasma-surface interaction