Highly-Oriented Atomically Thin Ambipolar MoSe Grown by Molecular Beam Epitaxy
arXiv:1705.10563 · doi:10.1021/acsnano.7b02726
Abstract
Transition metal dichalcogenides (TMDCs), together with other two-dimensional (2D) materials have attracted great interest due to the unique optical and electrical properties of atomically thin layers. In order to fulfill their potential, developing large-area growth and understanding the properties of TMDCs have become crucial. Here, we used molecular beam epitaxy (MBE) to grow atomically thin MoSe on GaAs(111)B. No intermediate compounds were detected at the interface of as-grown films. Careful optimization of the growth temperature can result in the growth of highly aligned films with only two possible crystalline orientations due to broken inversion symmetry. As-grown films can be transferred onto insulating substrates allowing their optical and electrical properties to be probed. By using polymer electrolyte gating, we have achieved ambipolar transport in MBE-grown MoSe. The temperature-dependent transport characteristics can be explained by the 2D variable-range hopping (2D-VRH) model, indicating that the transport is strongly limited by the disorder in the film.
References in corpus (7)
- Observation of giant bandgap renormalization and excitonic effects in a monolayer transition metal dichalcogenide semiconductor
- Evolution of Interlayer Coupling in Twisted MoS2 Bilayers
- Electron and Hole Mobilities in Single-Layer WSe2
- Dense network of one-dimensional mid-gap metallic modes in monolayer MoSe2 and their spatial undulations
- Disorder engineering and conductivity dome in ReS2 with electrolyte gating
- A high-mobility electronic system at an electrolyte-gated oxide surface
- Millimeter-scale layered MoSe2 grown on sapphire and evidence for negative magnetoresistance