Characterization of the second- and third-order nonlinear optical susceptibilities of monolayer MoS using multiphoton microscopy
arXiv:1606.08093
Abstract
We report second- and third-harmonic generation in monolayer MoS as a tool for imaging and accurately characterizing the material's nonlinear optical properties under 1560 nm excitation. Using a surface nonlinear optics treatment, we derive expressions relating experimental measurements to second- and third-order nonlinear sheet susceptibility magnitudes, obtaining values of m V and for the first time for monolayer MoS, m V. These sheet susceptibilities correspond to effective bulk nonlinear susceptibility values of m V and m V, accounting for the sheet thickness. Experimental comparisons between MoS and graphene are also performed, demonstrating 3.4 times stronger third-order sheet nonlinearity in monolayer MoS, highlighting the material's potential for nonlinear photonics in the telecommunications C band.
Accepted by 2D Materials, 28th Oct 2016
References in corpus (8)
- Atomically thin MoS2: A new direct-gap semiconductor
- Two Dimensional Atomic Crystals
- Control of valley polarization in monolayer MoS2 by optical helicity
- Strong nonlinear optical response of graphene flakes measured by four-wave mixing
- Observation of Intense Second Harmonic Generation from MoS Atomic Crystals
- Second harmonic microscopy of monolayer MoS2
- Transport properties of monolayer MoS grown by chemical vapour deposition
- Optical Third-Harmonic Generation in Graphene
Cited by in corpus (5)
- Giant enhancement of third-harmonic generation in graphene-metal heterostructures
- Cavity nonlinear optics with layered materials
- Electrically tunable second harmonic generation in atomically thin ReS2
- Tunable plasmon-enhanced second-order optical nonlinearity in transition metal dichalcogenide nanotriangles
- Layer Tunable Third-Harmonic Generation in Multilayer Black Phosphorus