Spin-mediated dissipation and frequency shifts of a cantilever at milliKelvin temperatures

Abstract

We measure the dissipation and frequency shift of a magnetically coupled cantilever in the vicinity of a silicon chip, down to $25$ mK. The dissipation and frequency shift originates from the interaction with the unpaired electrons, associated with the dangling bonds in the native oxide layer of the silicon, which form a two dimensional system of electron spins. We approach the sample with a $3.43$ $\mu$m-diameter magnetic particle attached to an ultrasoft cantilever, and measure the frequency shift and quality factor as a function of temperature and the distance. Using a recent theoretical analysis [J. M. de Voogd et al., arXiv:1508.07972 (2015)] of the dynamics of a system consisting of a spin and a magnetic resonator, we are able to fit the data and extract the relaxation time $T_1=0.39\pm 0.08$ ms and spin density $\sigma =0.14\pm 0.01$ spins per nm${}^2$. Our analysis shows that at temperatures $\le 500$ mK magnetic dissipation is an important source of non-contact friction.

5 pages, 3 figures