A universal platform for magnetostriction measurements in thin films

Abstract

We present a universal nanomechanical sensing platform for the investigation of magnetostriction in thin films. It is based on a doubly-clamped silicon nitride nanobeam resonator covered with a thin magnetostrictive film. Changing the magnetization direction within the film plane by an applied magnetic field generates a magnetostrictive stress and thus changes the resonance frequency of the nanobeam. A measurement of the resulting resonance frequency shift, e.g. by optical interferometry, allows to quantitatively determine the magnetostriction constants of the thin film. We use this method to determine the magnetostriction constants of a 10nm thick polycrystalline cobalt film, showing very good agreement with literature values. The presented technique can be useful in particular for the precise measurement of magnetostriction in a variety of (conducting and insulating) thin films, which can be deposited by e.g. electron beam deposition, thermal evaporation or sputtering.

References in corpus (8)

• A Mechanical Mass Sensor with Yoctogram Resolution
• Nanomechanical Resonators and Their Applications in Biological/Chemical Detection: Nanomechanics Principles
• Ultrasensitive force detection with a nanotube mechanical resonator
• Voltage controlled inversion of magnetic anisotropy in a ferromagnetic thin film at room temperature
• Stress-Induced Variations in the Stiffness of Micro- and Nanocantilever Beams
• Signatures of two-level defects in the temperature-dependent damping of nanomechanical silicon nitride resonators
• Determination of effective mechanical properties of a double-layer beam by means of a nano-electromechanical transducer
• Damping of metallized bilayer nanomechanical resonators at room temperature

Cited by in corpus (2)

• Recent Advances in Mechanical Torque Studies of Small-scale Magnetism
• Magnetoelasticity of $\mathrm{C}{\mathrm{o}}_{25}\mathrm{F}{\mathrm{e}}_{75}$ thin films