Structural stability and energy-gap modulation through atomic protrusion in freestanding bilayer silicene
arXiv:1504.06345 · doi:10.1103/PhysRevB.91.201405
Abstract
We report on first-principles total-energy and phonon calculations that clarify structural stability and electronic properties of freestanding bilayer silicene. By extensive structural exploration, we reach all the stable structures reported before and find four new dynamically stable structures, including the structure with the largest cohesive energy. We find that atomic protrusion from the layer is the principal relaxation pattern which stabilizes bilayer silicene and determines the lateral periodicity. The hybrid-functional calculation shows that the most stable bilayer silicene is a semiconductor with the energy gap of 1.3 eV.
References in corpus (8)
- Quantum ESPRESSO: a modular and open-source software project for quantum simulations of materials
- Biased bilayer graphene: semiconductor with a gap tunable by electric field effect
- Asymmetry gap in the electronic band structure of bilayer graphene
- Valley-Polarized Metals and Quantum Anomalous Hall Effect in Silicene
- Single Layer Behavior and Its Breakdown in Twisted Graphene Layers
- Photo-Induced Topological Phase Transition and a Single Dirac-Cone State in Silicene
- The atomic structure of the phase of silicene on Ag(111)
- Crossover between Silicene and Ultra-Thin Si Atomic Layers on Ag(111) Surfaces