DFT+U simulation of the TiO-TiO interface
arXiv:1501.05564 · doi:10.1103/PhysRevApplied.3.024009
Abstract
The formation of conducting channels of TiO inside TiO-based memristors is believed to be the origin for the change in electric resistivity of these devices. While the properties of the bulk materials are reasonably known, the interface between them has not been studied up to now mostly due to their different crystalline structures. In this work we present a way to match the interfaces between TiO and TiO and subsequently the band offset between these materials is obtained from density functional theory based calculations. The results show that while the valence band is located at the TiO, the conduction band is found at the TiO structure, resulting into a type II interface. In this case, the TiO would act as a donor to the TiO matrix.
6 pages, 5 figures