Antiferroelectricity in thin film ZrO2 from first principles
arXiv:1403.3878 · doi:10.1103/PhysRevB.90.140103
Abstract
Density functional calculations are performed to investigate the experimentally-reported field-induced phase transition in thin-film ZrO2 (J. Muller et al., Nano. Lett. 12, 4318). We find a small energy difference of ~ 1 meV/f.u. between the nonpolar tetragonal and polar orthorhombic structures, characteristic of antiferroelectricity. The requisite first-order transition between the two phases, which atypically for antiferroelectrics have a group-subgroup relation, results from coupling to other zone-boundary modes, as we show with a Landau-Devonshire model. Tetragonal ZrO2 is thus established as a previously unrecognized lead-free antiferroelectric with excellent dielectric properties and compatibility with silicon. In addition, we demonstrate that a ferroelectric phase of ZrO2 can be stabilized through epitaxial strain, and suggest an alternative stabilization mechanism through continuous substitution of Zr by Hf.
arXiv comment5 pages, 5 figures
References in corpus (6)
- Giant electrocaloric effect in thin film Pb Zr_0.95 Ti_0.05 O_3
- First-principles study of structural, vibrational and lattice dielectric properties of hafnium oxide
- Phonons and Lattice Dielectric Properties of Zirconia
- First-principles study of epitaxial strain in perovskites
- Antiferroelectricity and ferroelectricity in epitaxially strained PbZrO3 from first principles
- Orthorhombic semiconductors as antiferroelectrics
Cited by in corpus (23)
- The Origin of Ferroelectricity in Hf Zr O: A Computational Investigation and a Surface Energy Model
- Kinetically-stabilized Ferroelectricity in Bulk Singlecrystalline HfO2:Y without Wake-up Effects
- Structural Polymorphism Kinetics Promoted by Charged Oxygen Vacancies in HfO
- Effects of Growth Orientations and Epitaxial Strains on Phase Stability of HfO Thin Films
- Piezoelectricity in hafnia
- Stabilization of competing ferroelectric phases of HfO under epitaxial strain
- Deep Learning of Accurate Force Field of Ferroelectric HfO
- Enhanced ferroelectricity in epitaxial Hf0.5Zr0.5O2 thin films integrated with Si(001) using SrTiO3 templates
- Impact of Four-Valent Doping on the Crystallographic Phase Formation for Ferroelectric HfO from First-Principles: Implications for Ferroelectric Memory and Energy-Related Applications
- Causes of ferroelectricity in HfO-based thin films: An perspective
- Antiferroelectric negative capacitance from a structural phase transition in zirconia
- First-principles re-investigation of bulk WO3
- Phase Competition in HfO with Applied Electric Field from First Principles
- High-throughput first principles search for new ferroelectrics
- A computational study of hafnia-based ferroelectric memories: from ab initio via physical modeling to circuit models of ferroelectric device
- A CMOS-compatible morphotropic phase boundary
- The impact of charge compensated and uncompensated strontium defects on the stabilization of the ferroelectric phase in HfO
- Theoretical approach to ferroelectricity in hafnia and related materials
- Effect of dopant ordering on the stability of ferroelectric hafnia
- Origin of ferroelectricity in magnesium doped zinc oxide
- Symmetry of ferroelectric switching and domain walls in hafnium dioxide
- Ferroelectric HfO-ZrO multilayers with reduced wake-up
- Triggered ferroelectricity in HfO from hybrid phonons and higher-order dynamical charges