Epitaxial Growth of Spinel Cobalt Ferrite Films on MgAl${}_2$O${}_4$ Substrates by Direct Liquid Injection Chemical Vapor Deposition

Abstract

The direct liquid injection chemical vapor deposition (DLI-CVD) technique has been used for the growth of cobalt ferrite (CFO) films on (100)-oriented MgAl${}_2$O${}_4$ (MAO) substrates. Smooth and highly epitaxial cobalt ferrite thin films, with the epitaxial relationship $\mathrm{MAO}(100)[001]\parallel \mathrm{CFO}(100)[001]$, are obtained under optimized deposition conditions. The films exhibit bulk-like structural and magnetic properties with an out-of-plane lattice constant of $8.370\mathring{\mathrm{A}}$ and a saturation magnetization of $420kA/m$ at room temperature. The Raman spectra of films on MgAl${}_2$O${}_4$ support the fact that the Fe${}^{3+}$- and the Co${}^{2+}$-ions are distributed in an ordered fashion on the B-site of the inverse spinel structure. The DLI-CVD technique has been extended for the growth of smooth and highly oriented cobalt ferrite thin films on a variety of other substrates, including MgO, and piezoelectric lead magnesium niobate-lead titanate and lead zinc niobate-lead titanate substrates.

6 pages, 6 figures

Cited by in corpus (2)

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