Electron-electron scatttering in Sn-doped indium oxide thick films
arXiv:1306.5610 · doi:10.1209/0295-5075/103/47002
Abstract
We have measured the low-field magnetoresistances (MRs) of a series of Sn-doped indium oxide thick films in the temperature range 4--35 K. The electron dephasing rate as a function of for each film was extracted by comparing the MR data with the three-dimensional (3D) weak-localization theoretical predictions. We found that the extracted varies linearly with . Furthermore, at a given , varies linearly with , where is the Fermi wavenumber, and is the electron elastic mean free path. These features are well explained in terms of the small-energy-transfer electron-electron scattering time in 3D disordered conductors. This electron dephasing mechanism dominates over the electron-phonon (-ph) scattering process because the carrier concentrations in our films are 3 orders of magnitude lower than those in typical metals, which resulted in a greatly suppressed -ph relaxation rate.
5 pages, 3 figures
References in corpus (4)
- Origin of ferromagnetism in (Zn,Co)O from magnetization and spin-dependent magnetoresistance
- Electron dephasing in homogeneous and inhomogeneous indium tin oxide thin films
- Logarithmic temperature dependence of Hall transport in granular metals
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Cited by in corpus (4)
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