Antiferromagnetic Domain Wall Engineering in Chromium Films

Abstract

We have engineered an antiferromagnetic domain wall by utilizing a magnetic frustration effect of a thin iron cap layer deposited on a chromium film. Through lithography and wet etching we selectively remove areas of the Fe cap layer to form a patterned ferromagnetic mask over the Cr film. Removing the Fe locally removes magnetic frustration in user-defined regions of the Cr film. We present x-ray microdiffraction microscopy results confirming the formation of a 90° spin-density wave propagation domain wall in Cr. This domain wall nucleates at the boundary defined by our Fe mask.

submitted to APL

References in corpus (4)

• Direct measurement of antiferromagnetic domain fluctuations
• X-ray Microdiffraction Images of Antiferromagnetic Domain Evolution in Chromium
• Microscopic and Macroscopic Signatures of Antiferromagnetic Domain Walls
• Spin-dependent diffraction at ferromagnetic/spin spiral interface

Cited by in corpus (7)

• Staggered Dynamics in Antiferromagnets by Collective Coordinates
• Antiferromagnetic Domain Wall Motion Induced by Spin Waves
• Antiferromagnetic Domain Wall as Spin Wave Polarizer and Retarder
• The Intrinsic Magnetization of Antiferromagnetic Textures
• Ultrafast generation and dynamics of isolated skyrmions in antiferromagnetic insulators
• Soliton-like magnetization textures in non-collinear antiferromagnets
• Role of NiO in the nonlocal spin transport through thin NiO films on Y${}_3$Fe${}_5$O${}_{12}$