Robust surface electronic properties of topological insulators: Bi2Te3 films grown by molecular beam epitaxy
arXiv:1103.4548 · doi:10.1063/1.3595309
Abstract
The surface electronic properties of the important topological insulator Bi2Te3 are shown to be robust under an extended surface preparation procedure which includes exposure to atmosphere and subsequent cleaning and recrystallization by an optimized in-situ sputter-anneal procedure under ultra high vacuum conditions. Clear Dirac-cone features are displayed in high-resolution angle-resolved photoemission spectra from the resulting samples, indicating remarkable insensitivity of the topological surface state to cleaning-induced surface roughness.
3 pages, 3 figures
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Cited by in corpus (9)
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- Reversal of the circular dichroism in the angle-resolved photoemission from Bi2Te3
- Observation of spin-momentum locked surface states in amorphous BiSe
- Growth, characterization, and transport properties of ternary (Bi1-xSbx)2Te3 topological insulator layers
- Infrared/Terahertz Spectra of the Photogalvanic Effect in (Bi,Sb)Te based Three Dimensional Topological Insulators
- Terahertz Photogalvanic Spectroscopy of Three Dimensional Topological Insulators
- Intrinsic Ultrathin Topological Insulators Grown via MBE Characterized by in-situ Angle Resolved Photoemission Spectroscopy
- Gate-induced decoupling of surface and bulk state properties in selectively-deposited BiTe nanoribbons
- Photocurrent measurements in topological insulator nanowires