Roughness exponents and grain shapes

Abstract

In surfaces with grainy features, the local roughness $w$ shows a crossover at a characteristic length $r_c$, with roughness exponent changing from ${\alpha }_1\approx 1$ to a smaller ${\alpha }_2$. The grain shape, the choice of $w$ or height-height correlation function (HHCF) $C$, and the procedure to calculate root mean-square averages are shown to have remarkable effects on ${\alpha }_1$. With grains of pyramidal shape, ${\alpha }_1$ can be as low as 0.71, which is much lower than the previous prediction 0.85 for rounded grains. The same crossover is observed in the HHCF, but with initial exponent ${\chi }_1\approx 0.5$ for flat grains, while for some conical grains it may increase to ${\chi }_1\approx 0.7$. The universality class of the growth process determines the exponents ${\alpha }_2={\chi }_2$ after the crossover, but has no effect on the initial exponents ${\alpha }_1$ and ${\chi }_1$, supporting the geometric interpretation of their values. For all grain shapes and different definitions of surface roughness or HHCF, we still observe that the crossover length $r_c$ is an accurate estimate of the grain size. The exponents obtained in several recent experimental works on different materials are explained by those models, with some surface images qualitatively similar to our model films.

7 pages, 6 figures and 2 tables

References in corpus (5)

• Numerical study of the Kardar-Parisi-Zhang equation
• Numerical study of discrete models in the class of the nonlinear molecular beam epitaxy equation
• Surface and Bulk Properties of Deposits Grown with a Bidisperse Ballistic Deposition Model
• Finite-size effects in roughness distribution scaling
• Pentacene islands grown on ultra-thin SiO2

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