High Electron Mobility in Vacuum and Ambient for PDIF-CN2 Single-Crystal Transistors
arXiv:0902.0875 · doi:10.1021/ja809848y
Abstract
We have investigated the electron mobility on field-effect transistors based on PDIF-CN single crystals. The family of the small molecules PDI8-CN has been chosen for the promising results obtained for vapour-deposited thin film FETs. We used as gate dielectric a layer of PMMA (spinned on top of the SiO), to reduce the possibility of electron trapping by hydroxyl groups present at surface of the oxide. For these devices we obtained a room temperature mobility of 6 cm/Vs in vacuum and 3 cm/Vs in air. Our measurements demonstrate the possibility to obtain n-type OFETs with performances comparable to those of p-type devices.
published online in JACS
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