Morphology of Fine-Particle Monolayers Deposited on Nanopatterned Substrates

Abstract

We study the effect of the presence of a regular substrate pattern on the irreversible adsorption of nanosized and colloid particles. Deposition of disks of radius $r_0$ is considered, with the allowed regions for their center attachment at the planar surface consisting of square cells arranged in a square lattice pattern. We study the jammed state properties of a generalized version of the random sequential adsorption model for different values of the cell size, $a$, and cell-cell separation, $b$. The model shows a surprisingly rich behavior in the space of the two dimensionless parameters $\alpha =a/2r_0$ and $\beta =b/2r_0$. Extensive Monte Carlo simulations for system sizes of $500\times 500$ square lattice unit cells were performed by utilizing an efficient algorithm, to characterize the jammed state morphology.

11 pages, 10 figures, 3 tables

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Cited by in corpus (18)

• Nonequilibrium growth of patchy-colloid networks on substrates
• Nonequilibrium adsorption of 2AnB patchy colloids on substrates
• Random Sequential Adsorption of Oriented Superdisks
• Nonequilibrium self-organization of colloidal particles on substrates: adsorption, relaxation, and annealing
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• Two-stage random sequential adsorption of discorectangles and disks on a two-dimensional surface
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• Kinetics of Deposition of Oriented Superdisks
• Random Sequential Adsorption on mobile patches
• Percolation connectivity in deposits obtained using competitive random sequential adsorption of binary disk mixtures
• Monte Carlo simulation of selective adsorption in a binary hard-disk mixture on patterned adhesive surfaces
• Transitions between epitaxial growth regimes: A (1+1)-dimensional kinetic Monte Carlo study